SPIE Advanced Lithography 2016

Posted 16-02-22 11:15 | Permalink: www.nanotools.com/blog/spie-al-2016.html

Conference proceedings update:
M-CNT-150 for DSA depth measurements.

Learn how nanotools M-CNT-150 AFM tips contribute to characterize the "Influence of template fill in grapho-epitaxy DSA".

Conference: SPIE Advanced Lithography 2016, San Jose, California, USA
Session 13: DSA Materials: Fundamentals and Simulation
Date: Thursday 25 February 2016, 11:30 AM - 11:50 AM
Paper: 9779-49
Authors: Jan Doise, KU Leuven (Belgium); Joost P. Bekaert, Boon Teik Chan, IMEC (Belgium); Sung Eun Hong, Guanyang Lin, EMD Performance Materials Corp. (United States); Roel Gronheid, IMEC (Belgium)

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