CDR50-EBD product flyer
Posted 15-10-29 17:52 | Permalink: www.nanotools.com/blog/cdr50-ebd-product-flyer.html
Blue Line product flyer update:CDR50-EBD – The industry standard for high-performance mask inspection and wafer process monitoring.
- Proven reliability. Rotationally symmetric T-like shape with tight tip parameter specifications for reliable and consistent metrology measurements.
- Enhanced performance. Tilt-compensated to 3°±0.5° combined with an overhang of 10 nm for unmatched degrees of reentrancy.
- Ultra-high resolution. 5 nm tip edge radius for ultra-high resolution sidewall roughness measurements.
- Improved throughput. Significantly enhanced material durability compared to state-of-the-art Si CDR tips. For long-lasting tip performance and reduced cost per measurement.
