CD characterization of EUV photomask structures

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Publication update:
nanotools CDR-EBD tips featured in research article

Experience how nanotools diamond-like carbon CDR-EBD tips positively impact the long-term measurement stability of CD-AFM measurements

Title: Measurements of CD and sidewall profile of EUV photomask structures using CD-AFM and tilting-AFM, DOI: 10.1088/0957-0233/25/4/044002
Authors: Gaoliang Dai, Kai Hahm, Frank Scholze, Mark-Alexander Henn, Hermann Gross, Jens Fluegge and Harald Bosse, Physikalisch Technische Bundesanstalt/PTB (Germany)
Publication: Measurement Science and Technology
Publisher: IOP Publishing Ltd
Date: March 2014

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Used with permission from IOP Publishing Ltd.
Copyright © 2014 IOP Publishing Ltd. All rights reserved. This is an author-created, un-copyedited version of an article accepted for publication/published in Measurement Science and Technology. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at 10.1088/0957-0233/25/4/044002

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