Studying EUV Mask Absorber Side Wall Angle and Thickness Using AFM
Posted 23-07-30 03:18 | Permalink: www.nanotools.com/blog/studying-euv-mask-absorber-side-wall-angle-and-thickness-using-afm.html
Publication update:
nanotools MCNT-500™ featured in research article
Discover how nanotools 500nm long, tilt compensated, high aspect ratio MCNT-500™ is applied for side wall angle and thickness measurements on EUV masks.
- Title: Impact of EUV Absorber Variations on Wafer Patterning
DOI: 10.1117/12.2515511 - Authors: Lawrence S. Melvin III, Yudhishthir Kandel, Tim Fuehner, Ulrich Welling, Emily Gallagher, Andreas Frommhold, Yoshitake Shusuke
- Publication: Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X
- Publisher: SPIE
- Date: 26 March 2019
Copyright © SPIE
