Enabling Resist Recess Depth Recipe Transfer and Fab-to-Fab Matching

Publication update:

nanotools EBD4-200A featured in research article

Discover how nanotools 4µm long, tilt compensated, high aspect ratio EBD4-200A is applied for resist recess depth measurements in narrow trenches.

Title: AFM Surface Roughness and Depth Measurement of Trenches with High Aspect Ratio
DOI: 10.1109/ASMC.2019.8791811
Authors: Franz Heider, Helfried Schwarzfurtner, Mario Lugger, Sang-Joon Cho, Thomas Trenkler
Publication: Conference Proceedings: 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
Publisher: IEEE
Date: May 2019