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E-AFM Nanolithography Approach Enables High-Resolution Nanopatterning

Posted 23-10-31 03:30 | Permalink:
Publication update:
nanotools MCNT-500™ featured in research article

Discover how nanotools 500nm long, tilt compensated, high aspect ratio MCNT-500™ is applied for imaging and characterization of lithography features dimensions (depth and width).
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