German National Metrology Institute (PTB) Scientists study CD-AFM and TEM for reference EUV Photomask Metrology
Posted 22-03-30 08:15 | Permalink: www.nanotools.com/blog/german-national-metrology-institute-ptb-scientists-study-cd-afm-and-tem-for-reference-euv-photomask-metrology.html
Publication update:
nanotools CDR30-EBD probes featured in research article
Discover how nanotools CDR30-EBD with precisely controlled 30 nm width is applied to measure nanostructures of EUV photomask standards.
- Title: Comparison of EUV Photomask Metrology Between CD‑AFM and TEM
DOI: 10.1007/s41871-022-00124-y - Authors: Gaoliang Dai, Kai Hahm, Lipfert Sebastian and Markus Heidelmann
- Publication: Nanomanufacturing and Metrology
- Publisher: Springer Nature
- Date: February 3, 2022
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