Int'l Conference on Planarization/CMP Technology 2017

Posted 17-10-02 11:48 | Permalink: www.nanotools.com/blog/icpt-oct2017.html

Conference proceedings update:
In-line AFM measurement of erosion and dishing behaviors at different CMP conditions

Experience how nanotools MCNT-100™ AFM tips are successfully applied to accurately extract demanding local height variations with long term reliability.

Conference: International Conference on Planarization/CMP Technology, Katholieke Universiteit Leuven, Leuven, Belgium
Session D: Equipment, CMP Fundamentals
Date: Wednesday, October 11, 2017, 3:40 PM
Title: In-line Atomic Resolution Local Nanotopography Variation Metrology for CMP Process
Speaker (invited): Tae-Gon Kim, imec (Belgium)

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