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In Focus: Resist Recess Depth Monitoring of Narrow Trenches

Posted 24-03-30 18:20 | Permalink:
TransTech_Pub Publication in focus:
Franz Heider et al: AFM Surface Roughness and Depth Measurement of Trenches with High Aspect Ratio DOI: 10.1109/ASMC.2019.8791811

Discover how nanotools EBD4-200A probes are enabling metrology solutions for real-life semiconductor manufacturing. These heavy-duty carbon tips are effectively used for in-line process control for structures that cannot be measured with optical methos like scatterometry.
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