Advanced Semiconductor Manufacturing Conference 2017

Posted 17-05-02 14:18 | Permalink: www.nanotools.com/blog/asmc-2017.html

Conference proceedings update:
In-line AFM monitoring of local height variations in SADP Fin and wafer-to-wafer hybrid bonding processes

Experience how nanotools M-CNT-100 AFM tips are successfully applied to accurately extract demanding local height variations with long term reliability.

Conference: Advanced Semiconductor Manufacturing Conference 2017, Saratoga Springs, New York, USA
Session 7: Advanced Metrology II
Date: Wednesday, May 17, 2017, 9:20 AM
Title: In-line Metrology for Atomic Resolution Local Height Variation
Speaker: Tae-Gon Kim, imec (Belgium)

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