In Focus: Resist Recess Depth Monitoring of Narrow Trenches
Posted 24-03-30 18:20
Publication in focus:
Franz Heider et al: AFM Surface Roughness and Depth Measurement of Trenches with High Aspect Ratio DOI: 10.1109/ASMC.2019.8791811
Discover how nanotools EBD4-200A probes are enabling metrology solutions for real-life semiconductor manufacturing. These heavy-duty carbon tips are effectively used for in-line process control for structures that cannot be measured with optical methos like scatterometry.
Copyright © 2019, IEEE
Franz Heider et al: AFM Surface Roughness and Depth Measurement of Trenches with High Aspect Ratio DOI: 10.1109/ASMC.2019.8791811
Discover how nanotools EBD4-200A probes are enabling metrology solutions for real-life semiconductor manufacturing. These heavy-duty carbon tips are effectively used for in-line process control for structures that cannot be measured with optical methos like scatterometry.
-
Experimental setup:
Samples: Resist recess trenches on product wafers. Trenches were filled with resist and then etched back.
Tool: Park NX-Wafer operated in fully automated recipe mode, Park Systems
AFM probe: EBD4-200A, nanotools - Extracted feature parameters:
Resist recess trench depth - Key findings:
Single AFM tool (200 nm narrow, 1035 nm deep trenches)
0.6 nm < σ < 1.4 nm: 10-times dynamic repeatability of 5 dies
Accuracy: dimensional verification by cross sections in SEM
Measurement time: few seconds/site + 60 seconds for sample positioning
2 AFM tools: Fab to fab matching (480 nm deep trenches)
< 5 nm offset: 3 runs of 9-point recipe running the same wafer in 2 different fabs
Copyright © 2019, IEEE
Variations of Collagen Properties Following Accumulation of Advanced Glycation End-products
Posted 24-02-29 19:25Publication update:
nanotools SuperSharpStandard-FMR probes featured in research article
Discover how nanotools conical SSS-FMR with 2-3nm radius are applied for indentation measurements on collagen scaffolds.
- Title: Modulation of the biophysical and biochemical properties of collagen by glycation for tissue engineering applications
DOI: 10.1016/j.actbio.2022.11.033 - Authors: Mina Vaez, Meisam Asgari, Liisa Hirvonen, Gorkem Bakir, Emilie Khattignavong, Maya Ezzo, Sebastian Aguayo, Christina M. Schuh, Kathleen Gough, Laurent Bozec
- Publication: Acta Biomaterialia
- Publisher: Elsevier
- Date: 1 January 2023
© 2022 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
AFM Viscoelastic Quantification Over 5 Orders of Magnitude Frequency Range
Posted 24-01-31 02:47Publication update:
nanotools biosphere™ featured in research article
Discover how nanotools biosphere™ with 2µm radius are applied to quantify the nanoscale loss tangent, storage modulus, and loss modulus of polymeric materials.
- Title: Nanoscale rheology: Dynamic Mechanical Analysis over a broad and continuous frequency range using Photothermal Actuation Atomic Force Microscopy
DOI: 10.1021/acs.macromol.3c02052 - Authors: Alba R. Piacenti, Casey Adam, Nicholas Hawkins, Ryan Wagner, Jacob Seifert, Yukinori Taniguchi, Roger Proksch, and Sonia Contera
- Publication: Macromolecules
- Publisher: American Chemical Society
- Date: January 16 2024
Copyright © 2024 The Authors. Published by American Chemical Society.
This publication is licensed under CC-BY 4.0.
Video-Rate High-Speed-AFM To Study Permeability Barrier Within Yeast Nuclear Pore Complexes
Posted 23-11-30 04:02
Publication update:
nanotools QUANTUM-AC10 tips featured in research article
Discover how nanotools QUANTUM-AC10 (Soft & Sharp) with 0.1N/m cantilevers and 2-3nm radius are applied for video-rate HS-AFM imaging of nuclear pore complexes.
- Title: Dynamic molecular mechanism of the nuclear pore complex permeability barrier
DOI: 10.1101/2023.03.31.535055 - Authors: Toshiya Kozai, Javier Fernandez-Martinez, Trevor van Eeuwen, Paola Gallardo, Larisa E. Kapinos, Adam Mazur, Wenzhu Zhang, Jeremy Tempkin, Radhakrishnan Panatala, Maria Delgado-Izquierdo, Barak Raveh, Andrej Sali, Brian T. Chait, Liesbeth M. Veenhoff, Michael P. Rout, Roderick Y. H. Lim
- Publication: bioRxiv
- Pubisher: Cold Spring Harbor Laboratory
- Date: April 14, 2023
The Copyright holder for this preprint is the author/funder, who has granted bioRxiv a license to display the preprint in perpetuity.
It is made available under a CC-BY-NC-ND 4.0 International license.
E-AFM Nanolithography Approach Enables High-Resolution Nanopatterning
Posted 23-10-31 03:30Publication update:
nanotools MCNT-500™ featured in research article
Discover how nanotools 500nm long, tilt compensated, high aspect ratio MCNT-500™ is applied for imaging and characterization of lithography features dimensions (depth and width).
- Title: Electric-Field-Assisted Contact Mode Atomic Force Microscope-Based Nanolithography With Low Stiffness Conductive Probes
DOI: 10.1115/1.4054316 - Authors: Zhou, H., Jiang, Y., Dmuchowski, C. M., Ke, C., and Deng, J.
- Publication: Journal of Micro- and Nano-Manufacturing
- Publisher: ASME International
- Date: 28 April 20229
Copyright © 2023 The American Society of Mechanical Engineers
Developing High-Performance Optoelectronic and Electronic Devices
Posted 23-09-29 06:55Publication update:
nanotools EBD-NCH featured in research article
Discover how nanotools EBD-NCH with consistent radius are applied for investigating morphology and nucleation of Te crystallites/2D 2H-MoTe2 films.
- Title: Van der Waals Heteroepitaxy of Te Crystallites/2H-MoTe2 Atomically Thin Films on GaAs Substrates by Using Metal-Organic Chemical-Vapor Deposition
DOI: 10.3938/jkps.76.167 - Authors: Tae Wan Kim, Donghwan Kim, Yonghee Jo, Jonghoo Park, Hyun-Seok Kim & ChaeHo Shin
- Publication: Journal of the Korean Physical Society
- Publisher: Springer Nature
- Date: Jan 27, 2020
Copyright © 2020, The Korean Physical Society
AFM-based Nanoindentation Technique Detects Smallest Changes at Nanometer Scale
Posted 23-08-30 23:11Publication update:
nanotools biosphere™ featured in research article
Discover how nanotools biosphere™ with 300nm radius and 40N/m cantilevers are applied for mechanical characterization of cross-linked penicillin G acylase crystals.
- Title: Structure-Properties Correlation of Cross-Linked Penicillin G Acylase Crystals
DOI: 10.3390/cryst11040451 - Authors: Kubiak, Marta, Janine Mayer, Ingo Kampen, Carsten Schilde, and Rebekka Biedendieck
- Publication: Crystals
- Publisher: MDPI
- Date: 20 April 2021
Copyright © 2021, The Author(s)
Distributed under Creative Commons Attribution 4.0 International License.
Distributed under Creative Commons Attribution 4.0 International License.
Studying EUV Mask Absorber Side Wall Angle and Thickness Using AFM
Posted 23-07-30 03:18Publication update:
nanotools MCNT-500™ featured in research article
Discover how nanotools 500nm long, tilt compensated, high aspect ratio MCNT-500™ is applied for side wall angle and thickness measurements on EUV masks.
- Title: Impact of EUV Absorber Variations on Wafer Patterning
DOI: 10.1117/12.2515511 - Authors: Lawrence S. Melvin III, Yudhishthir Kandel, Tim Fuehner, Ulrich Welling, Emily Gallagher, Andreas Frommhold, Yoshitake Shusuke
- Publication: Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X
- Publisher: SPIE
- Date: 26 March 2019
Copyright © SPIE
Customer Notification: Introducing New QR Code Cards
Posted 23-06-29 19:38
Starting July 2023, nanotools will implement the following changes on the shipment of AFM probes:
The traditional A5 format Flyers
1. Handling HDC/DLC tips
The traditional A5 format Flyers
1. Handling HDC/DLC tips
will no longer be included in the shipments.
They will be replaced by smaller 8.5 x 5.5 cm cards with QR codes linking users to the same information.
There are no changes to the products, packaging size and material or
manufacturing location.
Why are we making this change?
This is part of our efforts to reduce nanotools carbon footprint.
The new cards help to
- Reduce transportation emissions (lighter shipments)
- Minimize waste at customer sites
Enabling Resist Recess Depth Recipe Transfer and Fab-to-Fab Matching
Posted 23-05-30 17:11Publication update:
nanotools EBD4-200A featured in research article
Discover how nanotools 4µm long, tilt compensated, high aspect ratio EBD4-200A is applied for resist recess depth measurements in narrow trenches.
- Title: AFM Surface Roughness and Depth Measurement of Trenches with High Aspect Ratio
DOI: 10.1109/ASMC.2019.8791811 - Authors: Franz Heider, Helfried Schwarzfurtner, Mario Lugger, Sang-Joon Cho, Thomas Trenkler
- Publication: Conference Proceedings: 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
- Publisher: IEEE
- Date: May 2019
Copyright © 2019, IEEE.